Illustrating their intersecting role in manufacturing and
technological development, this book examines tribological principles
and their applications in CMP, including integrated circuits, basic
concepts in surfaces of contacts, and common defects as well as
friction, lubrication fundamentals, and the basics of wear. The book
concludes its focus with mechanical aspects of CMP, pad materials,
elastic modulus, and cell buckling. As the first source to integrate
CMP and tribology, Tribology in Chemical-Mechanical Planarization
provides applied scientists and engineers in the fields of
semiconductors and microelectronics with clear foresight to the future
of this technology.
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Produktdetaljer
ISBN
9781040062197
Publisert
2024
Utgave
1. utgave
Utgiver
Vendor
CRC Press
Språk
Product language
Engelsk
Format
Product format
Digital bok
Forfatter