Surface Metrology for Micro- and Nanofabrication presents state-of-the-art measurement technologies for surface metrology in fabrication of micro- and nanodevices or components. This includes the newest general-purpose scanning probe microscopes, and both contact and non-contact surface profilers. In addition, the book outlines characterization and calibration techniques, as well as in-situ, on-machine, and in-process measurements for micro- and nanofabrication.
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1. Noncontact Scanning Electrostatic Force Microscope2. Quartz Tuning Fork Atomic Force Microscope3. Micropipette Ball Probing System4. Low-Force Elastic Beam Surface Profiler5. Linear-Scan Micro Roundness Measuring Machine6. Micro-Gear Measuring Machine7. On-Machine Length Gauge Surface Profiler8. On-Machine Air-Bearing Surface Profiler9. On-Machine Atomic Force Microscope10. On-Machine Roll Profiler11. In-Process Fast Tool Servo Profiler12. Self-Calibration of Prove Tip Radius and Cutting Edge Sharpness
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Presents state-of-the-art measurement technologies for micro- and nanoscale surface metrology
Provides materials scientists and engineers with an informed overview of the state-of-the-art in surface metrology Helps readers select and design the optimized surface metrology systems and carry out proper surface metrology practices in the fabrication of micro/nano-devices and components Assesses the best techniques for repairing micro-defects
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Produktdetaljer

ISBN
9780128178508
Publisert
2020-10-21
Utgiver
Vendor
Elsevier Science Publishing Co Inc
Vekt
910 gr
Høyde
235 mm
Bredde
191 mm
Aldersnivå
P, 06
Språk
Product language
Engelsk
Format
Product format
Heftet
Antall sider
448

Forfatter

Biographical note

Prof. Wei Gao is the Chair of the Precision Nanometrology Laboratory and Director of the Research Center for Precision Nanosystems at the Department of Fine Mechanics in the Graduate School of Engineering, Tohoku University, Japan. His research focuses on precision engineering, precision metrology, micro/nano-nanometrology, optical sensors, surface metrology, on-machine and in-process measurement, and motion measurement.